| 摘要 |
A semiconductor device which can realize a diode function is provided with a manufacturing process of a polysilicon thin film transistor and without adding a dedicated process. A semiconductor device is provided having a semiconductor layer comprising a low-concentration p-type polysilicon region formed over a substrate, the semiconductor device comprising a high-concentration p-type polysilicon region and a high-concentration n-type polysilicon region which are formed over the substrate on both sides of the low-concentration p-type polysilicon region, an insulating film which is formed over the high-concentration p-type polysilicon region, the low-concentration p-type polysilicon region, and the high-concentration n-type polysilicon region, and a control electrode which is formed over the insulating film and over the low-concentration p-type polysilicon region, wherein the control electrode is electrically connected to one of the high-concentration p-type polysilicon region and the high-concentration n-type polysilicon region.
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