发明名称 A Copper Plating Process
摘要 <p>Providing a copper plating method with which to precipitate copper-plated membranes that are uniform and flat, and that have good mirror gloss even when relatively thin copper plated membranes are formed. A copper plating method wherein the object to be plated and a pretreatment solution in which bromide compound ions are contained are brought into contact and copper is precipitated by means of electrical plating using a copper plating solution.</p>
申请公布号 EP2025778(A2) 申请公布日期 2009.02.18
申请号 EP20080161504 申请日期 2008.07.30
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 HAYASHI, SHINJIRO;TAKIGUCHI, HISANORI
分类号 C25D3/38;C25D5/34;H05K3/38 主分类号 C25D3/38
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