发明名称 |
A Copper Plating Process |
摘要 |
<p>Providing a copper plating method with which to precipitate copper-plated membranes that are uniform and flat, and that have good mirror gloss even when relatively thin copper plated membranes are formed. A copper plating method wherein the object to be plated and a pretreatment solution in which bromide compound ions are contained are brought into contact and copper is precipitated by means of electrical plating using a copper plating solution.</p> |
申请公布号 |
EP2025778(A2) |
申请公布日期 |
2009.02.18 |
申请号 |
EP20080161504 |
申请日期 |
2008.07.30 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
HAYASHI, SHINJIRO;TAKIGUCHI, HISANORI |
分类号 |
C25D3/38;C25D5/34;H05K3/38 |
主分类号 |
C25D3/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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