SURFACE TREATING FLUID FOR FINE PROCESSING OF MULTI-COMPONENT GLASS SUBSTRATE

摘要

The object of the present invention is to provide a surface treatment solution for finely processing a glass substrate containing multiple ingredients like the one used for the construction of a liquid crystal-based or organic electroluminescence-based flat panel display device, without evoking crystal precipitation and surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution is adjusted as follows. If such an acid-added etching solution with the concentration x of the acid varied is applied to a silicon oxide film heated to as high a temperature as required for etching, and the etching rate f(x) Ä ANGSTROM /minÜ is plotted as a function of the concentration x of the acid in the solution, and it is found that f(x) takes a minimum f(x1) when x = x1, and the concentration x of the acid which gives f(x) equal to f(x=0)=äf(x2)ü/2 is taken as x2, the concentration x of the acid in the solution is adjusted to be (2/5)*x1 < x < x2.