发明名称 |
Patterning solution deposited thin films with self-assembled monolayers |
摘要 |
The present invention provides a method of forming a patterned thin film on a surface of a substrate having thereon a patterned underlayer of a self-assembled monolayer. The method comprises depositing a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate. The present invention further provides processes for preparing the self-assembled monolayer. The present invention still further provides solution-based deposition processes, such as spin-coating and immersion-coating, to deposit a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate. |
申请公布号 |
US7491286(B2) |
申请公布日期 |
2009.02.17 |
申请号 |
US20040761798 |
申请日期 |
2004.01.21 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
KAGAN CHERIE R;CARMICHAEL TRICIA BREEN;KOSBAR LAURA LOUISE |
分类号 |
B44C1/16;B05D5/12;B44C1/165;C03C15/00;C03C25/16;C03C25/68;G03F7/00;G03F7/16;G03F7/40;H01L21/208;H01L21/30;H01L51/00;H01L51/40;H05K3/12 |
主分类号 |
B44C1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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