| 摘要 |
Methods, systems and apparatus for using nanoparticle seeded short-wavelength discharge generator sources discharge sources, for use with X-ray, XUV and EUV light emissions. Applications can include EUV lithography. Additional embodiments can use the generator sources for Hollow Cathode Plasma Discharge (HCPD) lamps, and dense plasma focus (DPF) devices and other sources. Target streams of gases such as Xe and nanoparticles such as tin, copper, or lithium can be heated with laser type sources to emit nano-droplets therefrom.
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