Pattern layout and layout data generation method

摘要

A transistor layout including a diffusion region and a gate line. The gate line intersects part of the diffusion region in an overlapping manner. The layout includes an L-shaped bent portion included in the diffusion region. An auxiliary pattern is included in the diffusion region opposite to the L-shaped bent portion so that the gate line is located between the L-shaped bent portion and the auxiliary pattern. The auxiliary pattern and the L-shaped bent portion are spaced from the gate line by the same distance.