发明名称 Multi-functional cyclic silicate compound, siloxane-based polymer prepared from the compound and process of producing insulating film using the polymer
摘要 A multi-functional cyclic silicate compound, a siloxane-based polymer prepared from the silicate compound and a process of producing an insulating film using the siloxane-based polymer. The silicate compound of the present invention is highly compatible with conventional pore-generating substances and hardly hygroscopic, so it is useful for the preparation of a siloxane-based polymer suitable to a SOG process. Furthermore, a film produced by the use of such siloxane-based polymer is excellent in mechanical properties, thermal stability and crack resistance and enhanced in insulating properties by virtue of its low hygroscopicity. Therefore, in the field of semiconductor production, this film is of great use as an insulating film.
申请公布号 US7491785(B2) 申请公布日期 2009.02.17
申请号 US20040841553 申请日期 2004.05.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SHIN HYEON JIN;JEONG HYUN DAM;SEON JONG BACK;LEE KWANG HEE;MAH SANG KOOK
分类号 B05D5/12;C08G77/08;B05D7/24;C07F7/18;C07F7/21;C08G77/02;C08G77/04;C08G77/06;C08G77/14;C08G77/18;C08G77/50;C09D5/25;C09D183/02;C09D183/04;C09D183/14;H01L21/312 主分类号 B05D5/12
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