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发明名称
光阻材料及使用其之图型形成方法
摘要
一种光阻材料,其为含有经由酸使硷溶解性产生变化而形成基础树脂之高分子化合物,与作为高分子添加剂之具有羧酸铵盐之重复单位与至少具有1个氟原子之重复单位经共聚所得之高分子化合物。本发明为可提供一种具有优良之图型之矩形性与光罩忠实性之光阻材料。又,使用本发明之光阻材料所形成之光阻(photoresist)膜,经由光阻膜表面亲水性化之结果,可防止显影后光阻膜上团状缺陷(blob defect)之发生。又,可防止浸液曝光用之光阻保护膜间之混合(mixing)而防止图型形状之劣化。
申请公布号
TW200906866
申请公布日期
2009.02.16
申请号
TW097111481
申请日期
2008.03.28
申请人
信越化学工业股份有限公司
发明人
小林知洋;山润;原田裕次
分类号
C08F220/22(2006.01);G03F7/039(2006.01);C08F220/34(2006.01);H01L21/027(2006.01)
主分类号
C08F220/22(2006.01)
代理机构
代理人
林志刚
主权项
地址
日本
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