| 摘要 |
<p>A photolithography system is provided to reduce time for process exposure data by using a plurality of memories and data processor. In a photolithography system, a work station outputs vector data to an exposure control(30) as the pattern data(CAD/DAM data). A system control circuit(32) controls the exposure process and outputs a control signal to a DMD driver circuit(34), an address control circuit(37) and a table control circuit. The raster converting circuit(36) converts pattern data into raster data, which are two dimension dot pattern data and corresponds to the image of the circuit pattern. Raster data are generated in each exposure unit and are stored in the serially connected buffer memory(38A,38B,38C).</p> |
