| 摘要 |
<p>A positive resist composition containing resin component (A) and acid generator component (B), characterized in that the component (A) contains structural unit (a1) derived from hydroxystyrene and structural unit (a2) having an acetal based acid dissociative dissolution inhibiting group while the component (B) contains acid generator (B1-i) having at least one anion moiety selected from the group represented by the general formulae (b-3), (b-4) and (b-5), or acid generator (B1-ii) having an anion moiety represented by the general formula (b-6), or acid generator (B1-iii) having a cation moiety represented by the general formula (b'-3). (b-3), (b-4), (b-5) (b-6) (b'-3).</p> |
