SURFACE INSPECTION DEVICE

摘要

A surface inspection device (1) includes an illumination optical system (30) for applying a rectilinear polarized light (L1) to a surface of a wafer (10) where a repeated pattern is formed; an alignment stage (20) for holding the wafer (10); an imaging optical system (40) for capturing an image of reflected light from the surface of the wafer (10); an image storage unit (51) for storing the image captured by the imaging optical system (40); an image processing unit (52) for performing predetermined image processing on the image stored in the image storage unit (51) and detecting a defect of the repeated pattern; and an image output unit (53) for outputting the result of the image processing by the image processing unit (52). The direction of the transmission axis of a second polarizing plate (43) is set to be inclined by 45 degrees against the transmission axis of a first polarizing plate (32).