| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a recording medium capable of easily setting a processing condition and describing processing steps capable of coping even with the etching processing of a hard-to-work material or a substrate to be processed in a complicated structure. <P>SOLUTION: The computer-usable recording medium stores a control program used by a controller in a plasma processor comprising a pressure reduction processing chamber 110 provided with a gas supplier 109 for supplying a raw gas and a gas exhaust apparatus, a substrate electrode 112 arranged inside the pressure reduction processing chamber for mounting the substrate to be processed, a plasma generator 101 for generating plasma by supplying high frequency energy to the raw gas inside the pressure reduction processing chamber, and the controller for controlling the gas supplier, the gas exhaust apparatus and the plasma generator. The control program includes a part describing each of the plurality of processing steps that the plasma processor executes to the substrate to be processed, a part describing the execution order of the respective processing steps, and a part describing the number of times of execution. <P>COPYRIGHT: (C)2009,JPO&INPIT |
