| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter that improves a pattern formation limit to form a finer pattern. <P>SOLUTION: The present invention provides the method of manufacturing the color filter, including: forming a first color pattern in a repeating pattern on a support; forming, on the support, a second color pattern in stripes in regions where the first color pattern is not formed; removing at least one portion of the first color pattern and/or the second color pattern by dry-etching, the portion being in a region where a third color pattern is to be formed; and forming, on the support, the third color pattern in the region where the portion of the first color pattern and/or the second color pattern has been removed. <P>COPYRIGHT: (C)2009,JPO&INPIT |
