| 摘要 |
PROBLEM TO BE SOLVED: To prevent physical properties of a vapor deposition material formed on an article to be vapor-deposited from changing even when the vapor deposition material has been continuously used after having been replenished. SOLUTION: The film-forming apparatus has an evaporation source composed of at least a crucible, the vapor deposition material and an electron-beam source, and a shutter for shielding a space between the evaporation source and the article to be vapor-deposited. The operation method includes evaporating a predetermined amount of the vapor deposition material again, in a state in which the film-forming apparatus has no article to be vapor-deposited therein after the film-forming operation has been finished. COPYRIGHT: (C)2009,JPO&INPIT
|
