| 摘要 |
<p>A process for manufacturing an optical matrix device, in which in the operation of printing coating film formation, when at least one of conductive, semiconductor and insulating materials for device construction is formed by the printing coating film formation, thermal processing in the thermal processing step is applied to the above at least one of conductive, semiconductor and insulating materials. This application of thermal processing would enhance the performance of device (in Examples, flat panel X-ray detector (FPD)).</p> |
