| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus and a substrate treatment method which can increase the operating rate of the apparatus when performing a predetermined treatment on a substrate contained in a lot. SOLUTION: In each treatment unit 1-4, a cleanliness level corresponding to the measurement results of particle counters 41-44 out of prescribed three measured cleanliness levels MA-MC is set as a measured level. Also on the lot side, a cleanliness level required of a lot that a substrate W belongs to out of prescribed three required cleanliness levels is set as a required level. Based on a relationship between the three measured cleanliness levels MA-MC and the three required cleanliness levels RA-RC, either one of the treatment units 1-4 is selected according to the required level, and the substrate W is treated by the selected treatment unit. COPYRIGHT: (C)2009,JPO&INPIT
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