发明名称 CORRUGATED INTERFACES FOR MULTILAYERED INTERCONNECTS
摘要 Dielectric composite structures comprising interfaces possessing nanometer scale corrugated interfaces in interconnect stack provide enhances adhesion strength and interfacial fracture toughness. Composite structures further comprising corrugated adhesion promoter layers to further increase intrinsic interfacial adhesion are also described. Methods to form the nanometer scale corrugated interfaces for enabling these structures using self assembling polymer systems and pattern transfer process are also described.
申请公布号 US2009041989(A1) 申请公布日期 2009.02.12
申请号 US20070836253 申请日期 2007.08.09
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CLEVENGER LAWRENCE A.;DALTON TIMOTHY J.;HUANG ELBERT E.;PURUSHOTHAMAN SAMPATH;RADENS CARL J.
分类号 B32B3/28;B05D3/04;B05D3/06 主分类号 B32B3/28
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