发明名称 METHOD FOR MANUFACTURING A MAGNETIC MEMORY DEVICE AND MAGNETIC MEMORY DEVICE
摘要 A method for manufacturing a magnetic memory device which includes a TMR element, and the method includes: a step of forming a lower wiring layer; a step of forming an interlayer insulating layer on the lower wiring layer; a step of forming an opening in the interlayer insulating layer so that the lower wiring layer is exposed; a step of forming a barrier metal layer so that the interlayer insulating layer and an inner surface of the opening are covered; a step of forming a metal layer on the barrier metal layer so that the opening is embedded; a polishing step of removing the metal layer on the barrier metal layer through polishing using the barrier metal layer as a stopper so that a wiring layer that includes a metal layer being embedded in the opening and the barrier metal layer is formed; and an element fabricating step of fabricating a TMR element on the wiring layer.
申请公布号 US2009039451(A1) 申请公布日期 2009.02.12
申请号 US20080187846 申请日期 2008.08.07
申请人 UENO SHUICHI;FURUTA HARUO;MATSUDA RYOJI;FUKUMURA TATSUYA;HASEGAWA SHIN;HIRANO SHINYA;CHIBAHARA HIROYUKI;OSHITA HIROSHI 发明人 UENO SHUICHI;FURUTA HARUO;MATSUDA RYOJI;FUKUMURA TATSUYA;HASEGAWA SHIN;HIRANO SHINYA;CHIBAHARA HIROYUKI;OSHITA HIROSHI
分类号 H01L29/82;H01L21/00;H01L21/4763;H01L23/52 主分类号 H01L29/82
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