发明名称 IMPRINT METHOD AND IMPRINT APPARATUS
摘要 An imprint method for imprinting an imprint pattern provided to a mold onto a pattern forming layer formed on a substrate is constituted by a first step of effecting alignment between the substrate and the mold with feedback control; a second step of bringing the mold and the pattern forming layer into contact with each other; a third step of curing the pattern forming layer; and a fourth step of increasing a gap between the substrate and the mold. The imprint method further includes a step of stopping the feedback control between the first step and the second step and/or between the second step and the third step.
申请公布号 WO2008099795(A3) 申请公布日期 2009.02.12
申请号 WO2008JP52219 申请日期 2008.02.05
申请人 CANON KABUSHIKI KAISHA;OKUSHIMA, SHINGO;SUEHIRA, NOBUHITO;SEKI, JUNICHI;KASUMI, KAZUYUKI 发明人 OKUSHIMA, SHINGO;SUEHIRA, NOBUHITO;SEKI, JUNICHI;KASUMI, KAZUYUKI
分类号 G03F7/00;G03F9/00 主分类号 G03F7/00
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