| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method which is capable of conducting the treatment of a fluoride compound discharged from a semi-conductor and liquid crystal manufacturing factory with a low running cost and high degradability. <P>SOLUTION: In the treatment method of a fluoride compound-containing gas to decompose a gas to be treated containing the fluoride compound, the method comprises the wet removal step to remove at least either one of an acidic gas or solid matter from the gas to be treated and the fluoride compound decomposing step to decompose the fluoride compound in the gas to be treated with a catalyst. Further, the method has the hydrocarbon supplying step to supply a hydrocarbon to the gas to be treated before conducting the wet removal process or the gas to be treated that has been subjected to the wet removal process. That is, the method enhances the low temperature activities by adding a hydrocarbon represented by methane or ethylene and simultaneously treating the same, and the running cost is reduced because energy needed for elevating the temperature can be reduced by utilizing the heat of combustion of the hydrocarbon. <P>COPYRIGHT: (C)2009,JPO&INPIT |
