发明名称 REMOVING APPARATUS OF SCATTERED PARTICLES, REDUCTION METHOD OF SCATTERED PARTICLES, LIGHT SOURCE APPARATUS, EXPOSURE APPARATUS AND MANUFACTURING METHOD OF ELECTRONIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To efficiently remove scattered particles without reducing the light quantity of EUV light. <P>SOLUTION: This removing apparatus for reducing the scattered particles, which irradiates the optical path of EUV light with charged particles, comprises an ejection section for ejecting charged particles at a predetermined solid angle and enlarging an irradiation region to be irradiated with the charged particles within the optical path, and a recovery section for recovering the scattered particles charged through irradiation with the charged particles. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009032791(A) 申请公布日期 2009.02.12
申请号 JP20070193346 申请日期 2007.07.25
申请人 NIKON CORP 发明人 YAMADA ATSUSHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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