发明名称 Integrated Circuit Having a Cell with a Resistivity Changing Layer
摘要 In an embodiment of the invention, an integrated circuit having a cell is provided. The cell may include a field effect transistor structure which includes a gate stack and a resistivity changing material structure disposed above the gate stack, wherein the resistivity changing material structure includes a resistivity changing material which is configured to change its resistivity in response to the application of an electrical voltage to the resistivity changing material structure.
申请公布号 US2009039329(A1) 申请公布日期 2009.02.12
申请号 US20070837380 申请日期 2007.08.10
申请人 HOFMANN FRANZ;WILLER JOSEF 发明人 HOFMANN FRANZ;WILLER JOSEF
分类号 H01L47/00;H01L21/00 主分类号 H01L47/00
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