| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical device having a desired characteristic, with which SiO<SB>2</SB>film is processed with high accuracy in a simple step. SOLUTION: In the method of manufacturing the optical device, a resist film 3 is patterned on the SiO<SB>2</SB>film 2 so as to satisfy 1.0≤L/H, where H represents the thickness of the SiO<SB>2</SB>film 2 and L represents the thickness of the resist film 3. Further, by hardening the resist film 3 by an ultraviolet ray irradiation and a heat treatment, the etching selection ratio in the direction of the thickness of the SiO<SB>2</SB>film with respect to the resist film 3 is increased up to about 2. Accordingly, the reduction in the mask width WS of the resist film 3 viewed from the thickness direction is prevented until the etching of the SiO<SB>2</SB>film is completed and the SiO<SB>2</SB>film 2 is substantially vertically etched with a sufficient processing accuracy. Thus, core part 4 having a desired shape is obtained and a planer type optical waveguide 10 having preferred characteristics is manufactured. COPYRIGHT: (C)2009,JPO&INPIT |
