发明名称 Method For Utilizing Heavily Doped Silicon Feedstock To Produce Substrates For Photovoltaic Applications By Dopant Compensation During Crystal Growth
摘要 A method for using relatively low-cost silicon with low metal impurity concentration by adding a measured amount of dopant and or dopants before and/or during silicon crystal growth so as to nearly balance, or compensate, the p-type and n-type dopants in the crystal, thereby controlling the net doping concentration within an acceptable range for manufacturing high efficiency solar cells.
申请公布号 US2009039478(A1) 申请公布日期 2009.02.12
申请号 US20080044887 申请日期 2008.03.07
申请人 BUCHER CHARLES E;MELER DANIEL L;LEBLANC DOMINIC;BOLAVART RENE 发明人 BUCHER CHARLES E.;MELER DANIEL L.;LEBLANC DOMINIC;BOLAVART RENE
分类号 H01L29/06;H01L21/66 主分类号 H01L29/06
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