| 摘要 |
A method for fabricating a dielectric layer structure includes providing a substrate, forming at least a low-k dielectric layer on the substrate, forming a single tensile layer on the low-k dielectric layer, and performing a moisture preventing treatment on the single tensile film. The single tensile layer possesses a stress comparative to a stress of the low-k dielectric layer and a hydrophobic characteristic that prevents itself from absorbing moisture.
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