| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a film pattern photopatternable in a short time by using a low energy UV, that is, UV of a comparatively long wave length. SOLUTION: The method for forming a film pattern comprises a step ejecting liquid drops containing a compound represented by formula (0) [wherein X is a structure having reactivity to a functional group on a solid surface; Y is a decomposable structure itself; and Z is a structure capable of changing physical properties of the solid surface or a reactive structure] on a solid surface having the functional group. COPYRIGHT: (C)2009,JPO&INPIT |
