| 摘要 |
PROBLEM TO BE SOLVED: To process the whole substrate uniformly and more efficiently while suppressing the consumption of processing liquid. SOLUTION: A substrate processing apparatus 10 includes a conveying roller 14 which conveys the substrate S in a horizontal posture and reciprocally move the substrate S at a predetermined processing position during etching processing, a liquid guide plate 18 which includes a movement range E of a substrate in the reciprocal movement and is extended to a position upstream from the movement range E, and a nozzle 16 which ejects an etchant to a part of the liquid guide plate 18 outside the movement range E obliquely from an upstream side to a downstream side. COPYRIGHT: (C)2009,JPO&INPIT
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