DEPOSITED FILM FORMATION DEVICE, METHOD FOR FORMING DEPOSITED FILM, AND METHOD FOR FORMING ELECTROPHOTOGRAPHY PHOTORECEPTOR

摘要

PROBLEM TO BE SOLVED: To provide a deposited film formation device where a deposited film having excellent uniformity in film thickness and film properties can be stably formed for a long time. SOLUTION: The deposited film formation device comprises: a reaction vessel 111 in which a substrate 112 is installed, and pressure can be reduced; and an exhaust means capable of reducing the pressure in the reaction vessel, and forming a deposited film on the substrate 112. The exhaust means is connected with the reaction vessel 111 via an exhaust part. The exhaust part comprises an exhaust tube fitted plate 145 fitted so as to cover the opening part at the side wall of the reaction vessel 111, and in which a plurality of holes arranged along the longitudinal direction of the substrate 112 are formed: and a plurality of exhaust tubes 146-1 to 146-6 respectively provided at the plurality of holes. Further, the exhaust part comprises a means 147 of regulating the conductance of the exhaust tubes upon the formation of a deposited film. COPYRIGHT: (C)2009,JPO&INPIT