发明名称 MASK BLANK SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, MASK MANUFACTURING METHOD, AND MASK BLANK SUBSTRATE
摘要 An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of forming a marker (106a to 106d) for identifying or managing the substrate on each of at least a plurality of end faces among four end faces (104a to 104d) of the substrate. The four end faces are continuous with sides of the main surface, respectively.
申请公布号 US2009042109(A1) 申请公布日期 2009.02.12
申请号 US20080187052 申请日期 2008.08.06
申请人 HOYA CORPORATION 发明人 OKUBO YASUSHI
分类号 G03F1/38;G03F1/50;G03F1/60;H01L21/027 主分类号 G03F1/38
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