发明名称 STRESS RELIEF OF A SEMICONDUCTOR DEVICE
摘要 A semiconductor device (10) includes a die (12) including an active region (16, 32, 42, 50), a scribe region (24), and a perimeter, wherein the scribe region is closer to the perimeter than the active region. In one embodiment, the die further comprises a crack arrest structure (26) formed in the scribe region, and wherein the crack arrest structure includes one of curva-linear shapes and polygonal shapes concentrically oriented around a common center located at or near at least one corner of the die.
申请公布号 WO2009020713(A1) 申请公布日期 2009.02.12
申请号 WO2008US68023 申请日期 2008.06.24
申请人 FREESCALE SEMICONDUCTOR INC.;VO, NHAT DINH 发明人 VO, NHAT DINH
分类号 H01L23/48;H01L21/31;H01L21/44;H01L23/28 主分类号 H01L23/48
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