| 摘要 |
A photolithography system has at least one spatial light modulator, a scanning mechanism configured to move an exposure area relative to a target object in a scanning direction, a plurality of memories (1st to Nth memories), a data processor, and exposure controller. The exposure area is defined as a projection area of the spatial light modulator. The plurality of memories corresponds to a plurality of partial exposure areas that is defined by dividing the exposure area. The data processor successively writes exposure data into each memory in accordance with the timing of an exposure, and the exposure controller controls the plurality of light modulating elements on the basis of the relative position of the exposure area. The data processor writes newly generated exposure data into the first memory, and shifts exposure data stored in the 1st to (N-1)st memories to the 2nd to Nth memories, respectively. |
