| 摘要 |
An anti-reflective cross-linking agent polymer is provided to form an anti-reflective film with high refractive index and to obtain vertical patterns without standing wave effect by lowering the reflectivity in a dipping lithography process. An anti-reflective cross-linking agent polymer comprises a repeating unit of the chemical formula 1. In the chemical formula 1, R1 is hydrogen or methyl; m and n are independently an integer of 0-4. The repeating unit of the chemical formula 1 has the average molecular weight of 1,000~100,000. An anti-reflective film composition comprises a cross-linking agent polymer 100.0 parts by weight, base resin for optical absorption 30~1,000 parts by weight, thermal acid generator 2~20 parts by weight and organic solvent 2,000~10,000 parts by weight.
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