| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a monomer for a base resin of a resist material. <P>SOLUTION: A fluorine-containing monomer expressed by formula (1) is disclosed. In formula (1), R<SP>1</SP>represents H or a 1-20C monovalent hydrocarbon group, and when R<SP>1</SP>is a monovalent hydrocarbon group, a constituent -CH<SB>2</SB>- may be substituted with -O- or -C(=O)-; R<SP>2</SP>represents H, a fluorine atom, a methyl group or a trifluoromethyl group; each of R<SP>3</SP>and R<SP>4</SP>represents H or a 1-8C monovalent hydrocarbon group, or R<SP>3</SP>and R<SP>4</SP>may be mutually bonded to form an aliphatic hydrocarbon ring together with the carbon to which both of them are bonded; and A represents a 1-6C bivalent hydrocarbon group. The fluorine-containing monomer is useful as a monomer for manufacturing a base resin of a functional material and a radiation-sensitive resist material. A polymer compound obtained from the monomer is excellent in resolution and water proofing property and extremely effective for precise microprocessing as a base resin of a resist material. <P>COPYRIGHT: (C)2009,JPO&INPIT |
