| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus. <P>SOLUTION: The immersion lithographic apparatus is cleaned by a cleaning liquid essentially consisting of ultra-pure water, and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide having a concentration of up to 5%, or (c) ozone having a concentration of up to 50 ppm, or (d) oxygen having a concentration of up to 10 ppm, or (e) an arbitrary combination selected from (a)-(d). <P>COPYRIGHT: (C)2009,JPO&INPIT |
