| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron emission film capable of obtaining high emission current density at a low electric field. <P>SOLUTION: In an electron emission element having the electron emission film including metal and carbon, the density of the electron emission film excluding the metal is set up to be 1.2 g/cm<SP>3</SP>or more to 1.8 g/cm<SP>3</SP>, and a content of hydrogen in the electron emission film is set up to be 15 to 40 atom% against the whole atoms organizing the electron emission film. Further, a metal density in a range from the surface of the electron emission film to the depth of 10 nanometers is set up to be 0.1 to 40 atom% against the carbon atomic number included in the electron emission film. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
