发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To reduce the distribution of the width of a word line. SOLUTION: The method of manufacturing the semiconductor device has: a step of forming a bit line 12 inside a semiconductor substrate 10; a step of forming the plurality of word lines 22 in a fixed cycle crossing the bit line 12 on the semiconductor substrate 10; a step of removing a part of the plurality of word lines 22; a step of forming an interlayer dielectric on the semiconductor substrate 10; and a step of forming a plug metal 28 connected to the bit line through the interlayer dielectric in a region 40 where the part of the word lines is removed. COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009033030(A) |
申请公布日期 |
2009.02.12 |
申请号 |
JP20070197542 |
申请日期 |
2007.07.30 |
申请人 |
SPANSION LLC |
发明人 |
TAKAHATA NAOFUMI;AZUMA MASAHIKO;UTSUNO ITSUHIRO |
分类号 |
H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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