发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To reduce the distribution of the width of a word line. SOLUTION: The method of manufacturing the semiconductor device has: a step of forming a bit line 12 inside a semiconductor substrate 10; a step of forming the plurality of word lines 22 in a fixed cycle crossing the bit line 12 on the semiconductor substrate 10; a step of removing a part of the plurality of word lines 22; a step of forming an interlayer dielectric on the semiconductor substrate 10; and a step of forming a plug metal 28 connected to the bit line through the interlayer dielectric in a region 40 where the part of the word lines is removed. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009033030(A) 申请公布日期 2009.02.12
申请号 JP20070197542 申请日期 2007.07.30
申请人 SPANSION LLC 发明人 TAKAHATA NAOFUMI;AZUMA MASAHIKO;UTSUNO ITSUHIRO
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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