发明名称 IMAGING AND DEVICES IN LITHOGRAPHY
摘要 Systems and techniques for lithography. In one aspect, a method includes producing a microelectronic device by modulating an intensity and a phase of the zero diffraction order of a radiation with a device including subwavelength features having a pitch dimension smaller than one wavelength of the radiation.
申请公布号 US2009042111(A1) 申请公布日期 2009.02.12
申请号 US20080254101 申请日期 2008.10.20
申请人 INTEL CORPORATION 发明人 TEJNIL EDITA;BORODOVSKY YAN
分类号 G03F1/14;G03F1/00;G03F7/20 主分类号 G03F1/14
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