发明名称 Thin film field-effect transistor and process for producing the same
摘要 Such a thin film transistor and a process for producing the same are provided that is capable of preventing the FET characteristics from being deteriorated with a short channel length. Such a thin film field-effect transistor and a process for producing the same are provided that contains a substrate 10, a gate electrode 11, a gate insulating film 12 that is provided on the gate electrode, a source electrode 15 and a drain electrode 14 that are provided on the gate insulating film with a prescribed distance, and an organic electronic material layer 13 containing an organic electronic material that is provided on the gate insulating film and is in electrical contact with the source electrode and the drain electrode, with an acid, an acid derivative and/or a reaction product of an acid and the organic electronic material being present at least a part of an interface between the source electrode and the organic electronic material layer and an interface between the drain electrode and the organic electronic material layer.
申请公布号 US2009039342(A1) 申请公布日期 2009.02.12
申请号 US20060991379 申请日期 2006.08.24
申请人 FUJI ELECTRIC HOLDINGS CO., LTD. 发明人 MAEDA TAKAHIKO;KAWAKAMI HARUO;KATO HISATO;SEKINE NOBUYUKI;KATO KYOKO
分类号 H01L51/05;H01L51/40 主分类号 H01L51/05
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