发明名称 |
Methode zur Abstimmung der optischen Durchlässigkeit von Maskenstrukturen um den Prozessspielraum zu vergrössern |
摘要 |
A method of generating a mask for use in a photolithography process. The method includes the steps of determining a target mask pattern having a plurality of features to be imaged and an illumination system to be utilized to image the mask; identifying a critical pitch within the target pattern and optimizing illumination settings of the illumination system for imaging the critical pitch; identifying a forbidden pitch within the target pattern; and modifying the transmittance of the features having a pitch equal to or substantially equal to the forbidden pitch such that the exposure latitude of the features equal to or substantially equal to the forbidden pitch is increased. <IMAGE> |
申请公布号 |
DE602004018722(D1) |
申请公布日期 |
2009.02.12 |
申请号 |
DE20046018722T |
申请日期 |
2004.11.05 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
HSU, STEPHEN D.;CHEN, JANG FUNG;SHI, XUELONG;VAN DEN BROEKE, DOUGLAS |
分类号 |
G03F1/08;G03F1/14;G03B27/72;G03F7/20;G03F9/00;G06F17/50;H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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