发明名称 |
PROCESS-MODEL GENERATION METHOD, COMPUTER PROGRAM PRODUCT, AND PATTERN CORRECTION METHOD |
摘要 |
A process-model generation method according to an embodiment of the present invention comprises: forming a test pattern on a film to be processed by exposing a test mask having a mask pattern formed thereon; generating a plurality of process models having a different model parameter; performing a simulation of the mask pattern by using each of the process models to predict a plurality of model patterns; calculating a difference in dimension between the test pattern and each of the model patterns; extracting a model pattern in which the difference in dimension from the test pattern is within a scope of specification from the model patterns; and specifying the process model, which predicts the extracted model pattern, as the mask pattern.
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申请公布号 |
US2009044167(A1) |
申请公布日期 |
2009.02.12 |
申请号 |
US20080186244 |
申请日期 |
2008.08.05 |
申请人 |
MAEDA SHIMON |
发明人 |
MAEDA SHIMON |
分类号 |
G06F17/50;G03F1/36;G03F1/68;G03F1/70 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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