| 发明名称 |
LITHOGRAPHIC APPARATUS, REFLECTIVE MEMBER AND METHOD OF IRRADIATING UNDERSIDE OF LIQUID SUPPLY SYSTEM |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent or reduce contamination of an immersion lithographic apparatus. <P>SOLUTION: The lithographic apparatus that includes a reflector for reflecting a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system is disclosed. The construction of the reflector is also disclosed as is a method for irradiating the underside of a liquid supply system used for cleaning. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009033162(A) |
申请公布日期 |
2009.02.12 |
| 申请号 |
JP20080187824 |
申请日期 |
2008.07.18 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
ANTONIUS LEENDERS MARTINUS HENDRIKUS;VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA;JANSEN HANS;WATSO ROBERT DOUGLAS;DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS;CROMWIJK JAN WILLEM;THOMAS LAURSEN |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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