| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable adjustment of the optical characteristics of exposure light to a photosensitive board in correspondence to the light quantity ratio between beams of exposure light emitted from a plurality of light sources. <P>SOLUTION: The exposure apparatus 100 includes driving mechanisms 51 to 56 which drive an optical element included in at least either of an illuminating optical system IL and a projection optical system to change the optical characteristics of exposure light on a conjugate surface of a pattern DP, and a main control system 20 which, based on information corresponding to the light quantities of beams of exposure light emitted from first and second light sources among a plurality of light sources 1, detects information corresponding to the light quantity ratio between the beams of exposure light and changes the optical characteristics of exposure light based on the result of the detection, using at least one of the driving mechanisms 51 to 56. <P>COPYRIGHT: (C)2009,JPO&INPIT |
