发明名称 MEMS DEVICE FORMED INSIDE HERMETIC CHAMBER HAVING GETTER FILM
摘要 <P>PROBLEM TO BE SOLVED: To prevent performance degradation of a MEMS device by electrically stabilizing a getter film in the MEMS device including the getter film formed inside a hermetic chamber. <P>SOLUTION: The MEMS device 100 includes a movable portion and a fixed portion formed inside the hermetic chamber. The hermetic chamber is formed by a base material (oscillator) 10 of the MEMS device 100 and glass substrates 30 and 32 having concave portions 34, 36a, ..., 36f made therein. A part 40c of any continuous getter film 40 formed inside the hermetic chamber connects to only one of any one or a plurality of certain electrical potentials of the fixed portion or a ground potential of the fixed portion through the base material 10 of the MEMS device 100. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009028891(A) 申请公布日期 2009.02.12
申请号 JP20080155682 申请日期 2008.06.13
申请人 SUMITOMO PRECISION PROD CO LTD 发明人 TAKEMOTO TAKESHI;NISHIDA HIROSHI;TORAYASHIKI OSAMU;IKEDA TAKASHI;ARAKI RYUTA
分类号 B81B3/00;G01C19/56;G01P9/04 主分类号 B81B3/00
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