发明名称 |
MEMS DEVICE FORMED INSIDE HERMETIC CHAMBER HAVING GETTER FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To prevent performance degradation of a MEMS device by electrically stabilizing a getter film in the MEMS device including the getter film formed inside a hermetic chamber. <P>SOLUTION: The MEMS device 100 includes a movable portion and a fixed portion formed inside the hermetic chamber. The hermetic chamber is formed by a base material (oscillator) 10 of the MEMS device 100 and glass substrates 30 and 32 having concave portions 34, 36a, ..., 36f made therein. A part 40c of any continuous getter film 40 formed inside the hermetic chamber connects to only one of any one or a plurality of certain electrical potentials of the fixed portion or a ground potential of the fixed portion through the base material 10 of the MEMS device 100. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009028891(A) |
申请公布日期 |
2009.02.12 |
申请号 |
JP20080155682 |
申请日期 |
2008.06.13 |
申请人 |
SUMITOMO PRECISION PROD CO LTD |
发明人 |
TAKEMOTO TAKESHI;NISHIDA HIROSHI;TORAYASHIKI OSAMU;IKEDA TAKASHI;ARAKI RYUTA |
分类号 |
B81B3/00;G01C19/56;G01P9/04 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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