发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS, FILM-FORMING METHOD, AND METHOD OF PREPARING PROCESS RECIPE
摘要 PROBLEM TO BE SOLVED: To obtain a heat treatment system in which process recipe can be prepared, in a short time and the delivery schedule can be quickened. SOLUTION: A semiconductor fabrication apparatus comprises a controller for controlling the heat treatment system by process recipe. The controller displays a retrieval screen retrieving a plurality of process recipes created, depending on the constitution information of the heat treatment system. When the constitution information is inputted as a retrieval key and when a predetermined execution button is clicked, the controller displays a process recipe helpful for preparing the process recipe of the heat treatment system on the retrieval screen, based on the constitution information; and when the process recipe is selected, the content of the selected process recipe is displayed so as to be referred to on the retrieval screen, and an adjustment work is performed, based on the selected process recipe. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009033198(A) 申请公布日期 2009.02.12
申请号 JP20080264790 申请日期 2008.10.14
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 NAKANO MINORU;UENO MASAAKI
分类号 H01L21/02;H01L21/31 主分类号 H01L21/02
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