| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a supporting head for a new chemical mechanical polishing device. <P>SOLUTION: The supporting head mounts a substrate on a polishing face. The supporting head comprises a housing connectable to a drive shaft turned together, a base, a gimbal mechanism pivotally coupling the housing to the base to make the base rotatable with respect to the housing, and a flexible film having a fitting surface for the substrate. The flexible film is interconnected to the base, and extends from under the base to form a chamber. <P>COPYRIGHT: (C)2009,JPO&INPIT |
