| 摘要 |
An apparatus for controlling position of brush and the apparatus for cleaning a substrate having the same are provided to easily control the brush to the reference location by using the electrical contact of the test substrate and the contact part disposed at the brush. The conductive material is manufactured with the conductive material and is partly installed at the brush(220) for cleaning the substrate in the fin type. The contact part is electrically contacted with the test substrate for cleaning. The adjust part(234) is connected to the contact part. The contact unit contacts the test substrate. The adjusting part receives the electric signal and adjusts the location of brush. The end part of the contact unit is formed with the bending shape when contacting the test substrate.
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