| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive dry film resist, a manufacturing method therefor, and usage of it, which enables aqueous development and has superior resolution, flame retardancy, adhesion, moisture resistance, electrical reliability, sensitivity, and ease of handling. <P>SOLUTION: The photosensitive dry film resist has two or more layers including at least a first photosensitive layer and a second photosensitive layer. The first photosensitive layer contains a binder polymer, a (meth)acrylic compound, a photoreaction initiator, and a flame retardant as essential components. The second photosensitive layer contains a binder polymer, a (meth)acrylic compound, a dye, and/or a pigment as essential constituents. The second photosensitive layer substantially does not contain flame retardants, and contents of the dye and/or the pigment in the second photosensitive layer are higher than those of the first photosensitive layer. <P>COPYRIGHT: (C)2009,JPO&INPIT |
