| 摘要 |
PROBLEM TO BE SOLVED: To provide a production system of a display device equipped with a TFT (thin film transistor) of high performance neither impairing productivity nor increasing a production cost steeply. SOLUTION: The production system of the display device includes a film forming device, an etching device, a resist applying/developing device and an exposure device which are respectively connected by a process-to-process conveying mechanism or an in-process conveying mechanism. The production system is constituted to be capable of carrying out a process for forming the thin film transistor. The film forming device in the production system has a plasma CVD device for forming a microcrystal semiconductor film, and a laser processing device added to irradiate the microcrystal semiconductor film formed by the plasma CVD device, with laser beams. A substrate to be processed is moved between the plasma CVD device and the laser processing device by a conveying mechanism, the in-process conveying mechanism or the process-to-process conveying mechanism. COPYRIGHT: (C)2009,JPO&INPIT
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