| 摘要 |
PROBLEM TO BE SOLVED: To stably supply a developer to a substrate when the substrate having been coated with resist and exposed is developed. SOLUTION: Developer nozzles are discriminatingly used according to processes in the steps of: supplying a developer from a first developer nozzle to one of a center portion and a peripheral edge portion on the surface of a substrate in a belt-like shape and so that one end side of the belt-like region faces the center of the substrate while rotating the substrate around a perpendicular axis via a substrate holding unit holding the substrate, and moving the supply position of the developer to form the liquid film of the developer on the surface of the substrate; and supplying a developer from a second developer nozzle to the center portion of the substrate in a circular shape or in a belt-like shape longer than the developer supplied from the first developer nozzle so as to prevent the liquid film of the developer from being dried, and rotating the substrate around the perpendicular axis via the substrate holding unit to spread the developer to the peripheral portion of the substrate with centrifugal force. COPYRIGHT: (C)2009,JPO&INPIT |
