发明名称 Apparatus for forming nano pattern and method for forming the nano pattern using the same
摘要 The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.
申请公布号 US2009039293(A1) 申请公布日期 2009.02.12
申请号 US20080219547 申请日期 2008.07.23
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 PARK MEO YOUN;KIM JIN HA;HWANG SOO RYONG;JUNG IL HYUNG;LEE JONG HO
分类号 G21K5/04 主分类号 G21K5/04
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