发明名称 |
Apparatus for forming nano pattern and method for forming the nano pattern using the same |
摘要 |
The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.
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申请公布号 |
US2009039293(A1) |
申请公布日期 |
2009.02.12 |
申请号 |
US20080219547 |
申请日期 |
2008.07.23 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
PARK MEO YOUN;KIM JIN HA;HWANG SOO RYONG;JUNG IL HYUNG;LEE JONG HO |
分类号 |
G21K5/04 |
主分类号 |
G21K5/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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